References [ 3 ]
Butrón A, Orive E & Madariaga I (2011) Potential risk of harmful algae transport by ballast waters: The case of Bilbao Harbour. Marine Pollution Bulletin 62: 747-757.
Han M-S, Kim Y-P & Cattolica RA (2002) Heterosigma akashiwo (Raphidophyceae) resting cell formation in batch culture: Strain identity versus physiological response. Journal of Phycology 38: 304-317.
DOI: none
Martínez R, Orive E, Laza-Martínez A & Seoane S (2010) Growth response of six strains of Heterosigmaakashiwo to varying temperature, salinity and irradiance conditions. Journal of Plankton Research 32: 529-538.
Sequences [ 1 ]
EMBL/Genbank Links
(Bold text = submission by CCAP staff or collaborators)
Division/Phylum: Heterokontophyta/Ochrophyta Class: Raphidophyceae Order: Chattonellales

Note: for strains where we have DNA barcodes we can be reasonably confident of identity, however for those not yet sequenced we rely on morphology and the original identification, usually made by the depositor. Although CCAP makes every effort to ensure the correct taxonomic identity of strains, we cannot guarantee that a strain is correctly identified at the species, genus or class levels. On this basis users are responsible for confirming the identity of the strain(s) they receive from us on arrival before starting experiments.
For strain taxonomy we generally use AlgaeBase for algae and Adl et al. (2019) for protists.

Culture media, purity and growth conditions:
Medium: PE; Bacteria present; maintained by serial subculture;
Attributes
Authority(Hada) Hada 1968
IsolatorLackey
Collection Site coast of Florida, USA
Archive Date 2007-05-17 11:51:41
Archive Reason Dead
Axenicity Status Bacteria present
Environment Marine
Pathogen Not pathogenic: Hazard Class 1
Toxin Producer Not Toxic / No Data
Type Culture No
Equivalent StrainsPlymouth 239
Formerly Listed in CCAP asOlisthodiscus luteus N.Carter 1937

CCAP 934/3

Heterosigma akashiwo

  • Product Code: CCAP 934/3
  • Availability: Archived
This strain is Archived, see strain data below for archive reason. Please contact us for more information.